The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 29, 1991
Filed:
Jun. 08, 1987
Peter Wirz, Waldernbach, DE;
Leybold Aktiengesellschaft, Hanau, DE;
Abstract
Apparatus for reactive sputtering of an electrically resistive coating onto a planar substrate includes a magnetron cathode with a planar target of a metal which forms one component of the coating. The reaction gas, which provides another component of the coating, is released as close as possible to the target, but outside of its outline. The distance 'a' between the target surface and the substrate surface is less than 60 mm, and a mask system is provided at a distance 'd' from the substrate which is less than half the distance 'a'. The density of reaction gas particles in front of the substrate is thus increased, resulting in a high deposition rate.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile