The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 29, 1991
Filed:
Nov. 09, 1989
William L Ahlgren, Goleta, CA (US);
Santa Barbara Research Center, Goleta, CA (US);
Abstract
A reactor for laser-assisted CVD has a cylindrical symmetry and includes a high-speed horizontal rotating disk susceptor. The reactor of the invention provides for radiation, preferably UV laser radiation, to be introduced into the reactor radially along an axis. The radiation is constrained to occupy a thin region of space at or immediately adjacent to substrate surfaces upon which deposition is to occur. Preferably the radiation is provided as an annular beam that is reflected uniformly by a conical reflector to provide a relatively thin and uniform sheet of UV radiation that is approximately 0.1 mm to approximately 1.0 mm thick. In addition the reactor provides for Hg vapor, or any other gaseous reactant, to be introduced into the reactor at a same point on the axis as the laser radiation, separately from other reactants, and from a source coaxially disposed and external to the reactor.