The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 22, 1991

Filed:

Jul. 08, 1988
Applicant:
Inventors:

Hans-Peter Stormberg, Stolberg, DE;

Yoshio Watanabe, Tokyo, JP;

Isao Ochiai, Tokyo, JP;

Assignee:

U.S. Philips Corporation, New York, NY (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H05H / ;
U.S. Cl.
CPC ...
31511121 ; 31511131 ; 31511181 ; 2503 / ; 2504 / ; 31323131 ;
Abstract

A plasma ion source comprises coaxially oriented electrodes of which a first electrode has the shape of a rod and a second electrode an annular shape, positioned in a space filled with a gas of atomic number greater than that of Boron, a current source up to 100 KA to be reacted within 1 usec and structure for focussing ions located near a formed pinch plasma.


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