The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 15, 1991
Filed:
Apr. 11, 1989
Charles T Campbell, Bloomington, IN (US);
LK Technologies, Inc., Bloomington, IN (US);
Abstract
The ion flux obtainable from an otherwise conventional ion source, to project a controlled ion beam at a target contained within an evacuated target chamber, is significantly enhanced by providing a flow of an ionizable gas directly into the ion source canister instead of being supplied into the target chamber. Flux enhancement values exceeding an order of magnitude may thus be obtained with ionizable gases such as argon, helium and neon. The highly enhanced ion flux is particularly advantageous for applications such as sputtering and ion scattering spectroscopy (ISS).
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile