The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 15, 1991
Filed:
Mar. 20, 1990
Hiroki Omote, Kanagawa, JP;
Hideaki Kataoka, Kanagawa, JP;
Fuji Photo Film Co., Ltd., Kanagawa, JP;
Abstract
A self-processing film unit wherein a cover sheet is formed with a first portion and a second portion extending from an opening defining an image forming area toward a trapping member, the first portion is longer than the second portion, and the first portion bounds an air venting passage. The first portion ensures that the distance that surplus processing solution must travel to reach the air venting passage will be long. Therefore, the surplus processing solution flowing around the first portion is less than the surplus processing solution flowing around the second portion. The leading portion of the surplus processing solution flowing around the first portion is thus pooled at a position far from the exit of the air venting passage. If an adhesive layer is disposed between the first portion and the trapping member, the air venting passage is circuitous and therefore prevention of leadkage is ensured. furthermore, by providing a small opening in a portion of the film unit where the air venting passage is located, leakage can also be prevented.