The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 15, 1991
Filed:
Jan. 17, 1989
Applicant:
Inventors:
Edward S Yeung, Ames, IA (US);
Shun-Le Chen, Long Island City, NY (US);
Assignee:
Iowa State University Research Foundation, Inc., Ames, IA (US);
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02B / ; G02B / ;
U.S. Cl.
CPC ...
350-66 ; 350630 ; 350320 ;
Abstract
A means and method for producing linerization of scan velocity of resonant vibrating-mirror beam deflectors in laser scanning system including presenting an elliptical convex surface to the scanning beam to reflect the scanning beam to the focal plane of the scanning line. The elliptical surface is shaped to produce linear velocity of the reflective scanning beam at the focal plane. Maximization of linerization is accomplished by considering sets of criteria for different scanning applications.