The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 08, 1991
Filed:
Jul. 24, 1989
Applicant:
Inventors:
Heinrich Gruenwald, D-7431 Gomaringen, DE;
Hugh S Munro, Durham DH1 3RE, GB;
Assignee:
Other;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C03C / ; C03C / ;
U.S. Cl.
CPC ...
156643 ; 156662 ; 20419237 ; 65-315 ; 65 301 ; 65 31 ;
Abstract
The invention relates to a process for removing metal ions, particularly sodium, potassium and/or aluminum ions, from the thin outermost layer of items of glass or ceramic materials with enrichment by silicon dioxide, the items being subjected for a pre-specified time to a plasma - low-pressure plasma or corona discharge-induced plasma - , hydrogen, nitrogen or a noble gas being used as discharge gas.