The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 01, 1991

Filed:

Sep. 09, 1988
Applicant:
Inventors:

Yoshiharu Yabuki, Kanagawa, JP;

Jiro Tsukahara, Kanagawa, JP;

Taku Nakamura, Kanagawa, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C07C / ; C07D / ; C07D / ; C07D / ;
U.S. Cl.
CPC ...
544196 ; 544402 ; 546306 ; 548316 ; 564236 ;
Abstract

A base precursor in the form of a salt of an organic base with a carboxylic acid is disclosed. The organic base is a diacidic to tetraacidic base which is composed of two to four guanidine moieties and at least one linking group for the guanidine moities. The organic base is such a hydrophilic compound that the number of carbon atoms contained in the organic base is not more than six times the number of the guanidine moieties. The linking group is a residue of a hydrocarbon or a heterocyclic ring. The guanidine moiety corresponds to an atomic group formed by removing one or two hydrogen atoms from a compound having the following formula (I): ##STR1## where each of R.sup.1, R.sup.2, R.sup.3, R.sup.4 and R.sup.5 independently is hydrogen, an alkyl group, an alkenyl group, an alkynyl group, a cycloalkyl group, an aralkyl group, an aryl group or a heterocyclic group, each of which may have one or more substituent groups, and any two of R.sup.1, R.sup.2, R.sup.3, R.sup.4 and R.sup.5 may be combined together to form a five-membered or six-membered nitrogen-containing heterocyclic ring. A process for formation of an organic base from the base precursor and a light-sensitive material containing the base precursor are also disclosed.


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