The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 01, 1991
Filed:
Feb. 27, 1990
Applicant:
Inventors:
Assignee:
Tosoh Corporation, Shinnanyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
C03B / ; C03C / ; C03C / ;
U.S. Cl.
CPC ...
65 301 ; 65 324 ; 65 606 ; 65 607 ; 264-12 ;
Abstract
High-hardness silica glass having transparency substantially on the same level as silica glass and a Vickers hardness of 12-20 GPa is produced by covering silica glass with powder and treating the silica glass at a temperature of 1400.degree.-2500.degree. C. and a pressure of 10-300 MPa in an atmosphere of an inert gas or a nitrogen gas.
Segawa, Hideaki. (1991). High-hardness silica glass and method of producing the same (U.S. Patent No. 4981503). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4981503
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile