The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 25, 1990
Filed:
Nov. 30, 1989
Shein S Wang, Ponca City, OK (US);
Thomas D Cavanaugh, Ponca City, OK (US);
Douglas W Hanson, Ponca City, OK (US);
Conoco Inc., Ponca City, OK (US);
Abstract
In applying residual movement correction to common offset depth migrated data, common offset depth migration is applied using the best available velocity/depth model. Post migrated parts, which are depth migrated common midpoint gathers, are saved. The post migrated parts are treated as if they were in time not depth. Normal movement based on a constant velocity is removed. Velocity functions time-velocity pairs, are derived for the post migrated parts with normal movement removed using a standard velocity analysis program. Normal moveout based on these velocity functions is applied. The events on the post migrated parts ae not imaged to the same depth. The corrected post migrated parts are then stacked and displayed.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile