The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 25, 1990
Filed:
Jul. 03, 1989
Applicant:
Inventors:
John J Brennan, Portland, CT (US);
Francis S Galasso, Manchester, CT (US);
Richard D Veltri, East Hartford, CT (US);
David A Condit, Avon, CT (US);
Assignee:
United Technologies Corporation, Hartford, CT (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C / ; C23C / ;
U.S. Cl.
CPC ...
427249 ; 427255 ; 4272551 ; 4274197 ;
Abstract
Chemical vapor deposition (CVD) techniques for forming tough silicon carbide (SiC) matrix composites. The introduction of methyldichlorosilane (MDS) to a reactor containing a fiber preform which been flushed with a noble gas, causes the formation of a carbon layer around the fibers. The carbon interlayer improves the fracture toughness of the composite.