The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 25, 1990
Filed:
Jun. 09, 1989
Applicant:
Inventor:
Klaus Ruff, Troisdorf, DE;
Assignee:
Huels Aktiengesellschaft, Marl, DE;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C01B / ;
U.S. Cl.
CPC ...
423341 ; 423342 ;
Abstract
A process is described for increasing the percentage of silicon tetrachloride during the reaction of hydrogen chloride or a mixture of hydrogen chloride and chlorine with substances containing metallic silicon. In this process the chlorosilanes are exposed to a temperature ranging between 300.degree. C. and 1400.degree. C.