The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 25, 1990
Filed:
Aug. 03, 1989
Siemens Aktiengesellschaft, Berlin and Munich, DE;
Abstract
An extracorporeal lithotripsy apparatus includes a shock waves source which generates shock wave along an acoustic axis in a propagation direction, with the shock waves being caused to converge, either by a curvature of the shock wave source or by the use of a separate focusing element, at a focus region, the lithotripsy apparatus being initially positioned so that a calculus to be disintegrated is coincident with the focus region. During treatment, the calculus may be displaced from its original, identified position by patient movement, such as due to respiration. In addition to permitting adjustment of the position of the focus region along the longitudinal axis of the shock wave source, adjustable shock wave deflection elements are provided which are pentrated by the shock waves and which interact with the shock waves to deflect the shock waves and thereby cause the acoustic axis to deviate from the longitudinal axis, for permitting selected lateral adjustment of the positon of the focus region to accommodate lateral displacement of the calculus and maintain coincidence of the focus region and the calculus.