The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 25, 1990
Filed:
May. 05, 1989
Hideki Kamaji, Atsugi, JP;
Shin Araki, Yokohama, JP;
Fujitsu Limited, Kawasaki, JP;
Abstract
An apparatus for forming thin films on substrates includes a reactor vessel, and discharge and grounded electrodes opposably disposed within the reactor vessel. The discharge electrode has walls surrounding a hollow space having an outlet that is open to the grounded electrode. A starting gas is introduced into the reactor vessel through that hollow space. A radio frequency voltage is applied between the discharge and grounded electrodes to produce a discharge plasma zone therebetween. The potential of the discharge electrode is biased toward the negative side so that the discharge electrode behaves as a cathode to which a direct current voltage is applied, whereby a high density plasma is obtained in the hollow space of the discharge electrode.