The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 18, 1990
Filed:
Sep. 20, 1989
Fumio Tabata, Yokohama, JP;
Hidenori Sekiguchi, Isehara, JP;
Toru Kamada, Sagamihara, JP;
Yuji Sakata, Sagamihara, JP;
Fujitsu Limited, Kawasaki, JP;
Abstract
A vertical stepper transfers a circuit pattern formed on a mask onto a wafer using synchrotron radiation instead of a light source. The vertical stepper includes a wafer stage for having the wafer mounted thereon in the vertical direction and a mask stage for having the mask mounted thereon in the vertical direction. The wafer stage includes a coarse X-Y stage, a transfer member, and a wafer mounting member. The wafer mounting member is provided with a fine X-Y stage. The wafer mounting member is moved in the horizontal direction between a first position mounted on the coarse X-Y stage and a second position mounted on the mask stage by the transfer member. When exposed to the synchrotron radiation, the wafer mounting member is integrated with the mask stage. After the wafer and the mask are strictly correctly positioned by the fine X-Y stage, the wafer mounting member, integrated with the mask stage, is stepped and repeat exposed by scanning in the vertical direction.