The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 18, 1990

Filed:

May. 02, 1990
Applicant:
Inventors:

Hsun-Feng Li, Taiwan, TW;

Yih-Trong Hsieh, Taiwan, TW;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06F / ;
U.S. Cl.
CPC ...
364518 ; 364521 ; 340730 ; 340735 ;
Abstract

A method of generating hollow multistroke characters. First and second bit maps are created using border and interior data from a polygon fill drawing a first stroke. Data from the polygon fill drawing a second stroke is processed in a RMW LOGIC utilizing data signals from the first and second bit maps to modify the two bit maps. When completed the second bit map contains a depiction of the interiors of the strokes employed to create the character. When completed the first bit map contains a depiction of all of the borders of all of these strokes except those portions of the borders residing in the same addresses as the addresses of interior depiction in the second bit map. The character is made legible by displaying the first bit map on a cathode ray tube.


Find Patent Forward Citations

Li, Hsun-Feng. (1990). Method of creating hollow multistroke characters (U.S. Patent No. 4979130). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4979130

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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