The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 18, 1990
Filed:
Dec. 26, 1989
Hitoshi Kawamoto, Hohfu, JP;
Yoshimichi Ozawa, Hohfu, JP;
Hiroshi Naito, Hohfu, JP;
Yoshihiro Wada, Tokyo, JP;
Toshiaki Yamazaki, Tokyo, JP;
Ichiya Harada, Tokyo, JP;
Kanebo, Ltd., Tokyo, JP;
Konica Corporation, Tokyo, JP;
Abstract
There is disclosed a copolyester which comprises at least four compositions of: (A) terephthalic acid, and/or its ester forming derivative (terephthalic acid component) and isophthalic acid and/or its ester forming derivative (isophthalic acid component) with a molar ratio of 30/70 to 70/30; (b) 5 to 15 mole % of a dicarboxylic acid having sulfonate group and/or its ester forming derivative based on the all dicarboxylic acid components; (C) an alicyclic dicarboxylic acid and/or its ester forming derivative; and (D) 50 mole % of ethylene glycol based on the all glycol components; and a polyester film which comprises a subbing layer containing the copolyester provided on at least one side of a polyester film base.