The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 11, 1990
Filed:
Mar. 09, 1989
Steven N Bittenson, Bedford, MA (US);
Gary K Klauminzer, Lexington, MA (US);
Questek, Inc., Billerica, MA (US);
Abstract
An excimer laser including a discharge chamber containing a mixture of halogen, rare gas and buffer gas uses two gas sources to replenish the halogen in the discharge chamber while maintaining the concentrations of all the gases at the optimum levels. One of the gas sources, source A, contains a mixture of the rare gas and the buffer gas in optimum concentrations. The other gas source, source B, contains both the rare gas and the buffer gas, in optimum relative concentrations, and also the halogen, in a concentration which is greater than optimum. As the laser operates and the gain of the laser decreases due to halogen depletion, gas from source B is injected into the discharge chamber to raise the halogen concentration. Gas is then released from the chamber to reduce the chamber pressure to the original level. When halogen replenishment does not suffice to restore the laser gain, due to the build-up of contaminants in the chamber, a portion of chamber gas is released and it is replenished with fresh gas from both sources in proportions adequate to provide optimum concentrations of the various gases.