The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 04, 1990
Filed:
Dec. 13, 1989
Walter Hillen, Aachen, DE;
Stephan Rupp, Stolberg-Breinig, DE;
Ulrich Schiebel, Aachen, DE;
Ingo Schafer, Hamburg, DE;
U.S. Philips Corporation, New York, NY (US);
Abstract
The invention relates to a method of producing an X-ray exposure is provided by a photoconductor, which converts X-radiation into a charge pattern, is evenly charged locally before the X-ray exposure, is discharged by the exposure as a function of the intensity of the X-radiation and the surface of which is scanned after the exposure for detecting the charge density, an image value being formed for each image point, corresponding to the discharge at the image point. The measured image values may be falsified by the self-discharge of the photoconductor induced by X-radiation. Since the self-discharge always proceeds in accordance with the same time laws, the self-discharge effects are corrected utilizing the time of the scanning instants, i.e., position in time with respect to the X-ray exposure and the end of the charging of the photoconductor in conjunction with a characteristic discharge function of the photoconductor and a correction factor.