The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 04, 1990

Filed:

Feb. 28, 1986
Applicant:
Inventor:

Frank Jansen, Walworth, NY (US);

Assignee:

Xerox Corporation, Stamford, CT (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C23C / ;
U.S. Cl.
CPC ...
118723 ;
Abstract

An apparatus for preparing plasma deposited films comprised of a first electrode means; a second counterelectrode means; a receptable means for the first electrode means, and the second counterelectrode means; a substrate means to be coated contained on the first electrode means, which electrode means has contained therein permanent magnets; a gas inlet means; and a gas exhaust means, wherein a silane gas is introduced into the receptacle in a crossflow direction perpendicular to the axis of the cylindrical member.


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