The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 27, 1990

Filed:

Jan. 23, 1989
Applicant:
Inventor:

Akiko Gomyo, Tokyo, JP;

Assignee:

NEC Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01S / ;
U.S. Cl.
CPC ...
372 45 ; 372 46 ; 357 16 ; 357 17 ; 357 60 ;
Abstract

In a visible light semiconductor laser with (Al.sub.x Ga.sub.1-x).sub.0.5 In.sub.0.5 P (0.ltoreq.x .ltoreq.1) crystal layers and a process for growing an(Al.sub.x Ga.sub.1-x).sub.0.5 In.sub.0.5 P (0.ltoreq.x.ltoreq.1) crystal, a GaAs substrate on which (Al.sub.x Ga.sub.1-x).sub.0.5 In.sub.0.5 P is grown in an epitaxial method selected from MOVPE and MBE provides one selected from a (110) plane, a plane equivalent to the (110) plane, a (111) plane, and a plane equivalent to the (111) plane as a main plane for a crystal growth of (Al.sub.x Ga.sub.1-x).sub.0.5 In.sub.0.5 P. As a result, a bandgap energy Eg of the (Al.sub.x Ga.sub.1-x).sub.0.5 In.sub.0.5 P crystal can be the maximum value inherent to the mixed crystal independent on a growth temperature and a V/III ratio.


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