The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 20, 1990
Filed:
Feb. 28, 1989
Applicant:
Inventors:
Walter W Duley, King City, Ontario, CA;
Grant Kinsman, Downsview, Ontario, CA;
Assignee:
Other;
Primary Examiner:
Int. Cl.
CPC ...
B23K / ;
U.S. Cl.
CPC ...
21912166 ; 21912169 ; 2191218 ; 21912185 ;
Abstract
A method of modifying the reflectivity and emissivity of a surface of a material comprises the steps of irradiating the surface with a beam of coherent pulsed radiation at a power sufficient to generate a surface plasma and scanning said beam across said surface. Successive pulses of radiation are caused to overlap and chemical change at the surface is promoted by provision of a localized atmosphere. The surface produced has features on a scale of less than 50 microns and is restricted to a depth of less than 10.sup.-3 cm. The body of the material is not affected.