The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 20, 1990
Filed:
Dec. 07, 1988
Takashi Kawabe, Hitachi, JP;
Ataru Kobayashi, Toyonaka, JP;
Moriaki Fuyama, Hitachi, JP;
Makoto Morijiri, Hitachi, JP;
Eiji Ashida, Hitachiota, JP;
Masatoshi Tsuchiya, Hitachi, JP;
Tetsuya Okai, Hitachi, JP;
Masanobu Hanazono, Mito, JP;
Shinichi Hara, Odawara, JP;
Shinji Narishige, Mito, JP;
Hiroshi Ikeda, Tokyo, JP;
Hitachi, Ltd., Tokyo, JP;
Abstract
A method of forming a thin film pattern on a base having a step portion. This method comprises a first step of forming a thin film of given material on the base, a second step of forming a predetermined pattern of a first photoresist film on said thin film at one of a first portion including a lower part of the step portion and a second portion including an upper part of the step portion, a third step of forming a predetermined pattern of a second photoresist film on said thin film at the other of the first and second portions and a fourth step of applying ion-milling to said thin film of given material using masks said first and second photoresist film patterns formed on said thin film at the first and second portions.