The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 20, 1990

Filed:

Aug. 21, 1989
Applicant:
Inventors:

Ho J Park, Seoul, KR;

Moo S Rhim, Kumi, KR;

Hak M Kim, Kumi, KR;

Du H Kim, Deagu, KR;

Seog O Yoo, Chunceon, KR;

Sang H Kim, Seoul, KR;

Sang B Park, Gumi, KR;

Ink S Han, Gyungsangbuk, KR;

Jong T Park, Daegu, KR;

Si M Kim, Daegu, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B29C / ;
U.S. Cl.
CPC ...
264183 ; 264184 ; 2642104 ; 2642106 ; 26421118 ; 26421119 ; 264212 ; 264216 ; 264236 ; 264347 ;
Abstract

A process for preparing aromatic polyamide film wherein an aromatic diamine and an aromatic diacidchloride are dissolved in an amide polymerization solvent containing an inorganic salt, a partial polymerization is effected at a low temperature to form an optically anisotropic liquid crystalline prepolymer dope, continuously extruding through a film die under a draw ratio or subjecting to a shear and contacting the prepolymer with a second solvent which is a polymerization accelerating-precipitation solvent to obtain an aromatic polyamide film free of crystal defect layer perpendicular to the film axis and having high strength and a high degree of molecular orientation.


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