The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 13, 1990
Filed:
Aug. 13, 1987
Applicant:
Inventors:
Assignee:
Fuji Photo Film Co., Ltd., Kanagawa, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C07C / ; C07C / ; C07D / ; G03C / ;
U.S. Cl.
CPC ...
540579 ; 544242 ; 544282 ; 544330 ; 544352 ; 544358 ; 546152 ; 546186 ; 546242 ; 546244 ; 546304 ; 546311 ; 546348 ; 548199 ; 548315 ; 548323 ; 548335 ; 548347 ; 564225 ; 564240 ; 564241 ; 564391 ; 564462 ; 564463 ; 564503 ; 564506 ;
Abstract
A process for formation of a base from a base precursor, which comprises decomposing the base precursor in the presence of a catalyst. The base precursor has the following formula (I) or (II):
Takeda, Keiji. (1990). Process for formation of base and light-sensitive material (U.S. Patent No. 4970307). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4970307
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile