The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 06, 1990
Filed:
Nov. 20, 1989
Applicant:
Inventor:
David P Bujese, Butler, NJ (US);
Assignee:
Olin Corporation, Cheshire, CT (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03G / ;
U.S. Cl.
CPC ...
430 49 ; 430 54 ; 430126 ; 430306 ; 427 141 ;
Abstract
A method of preparing a permanent photopolymer master with a permanent latent image for use in electrostatic image transfer to a receiving substrate is provided in which the photopolymer master is first flood pre-exposed to increase the resistivity of the entire photopolymer material and then is selectively exposed for a second time to form the permanent latent image in areas of high resistivity and to leave the background areas of the photopolymer with lower resistivity.
Bujese, David. (1990). Method of preparing a permanent master with a permanent latent image for (U.S. Patent No. 4968570). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4968570
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