The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 06, 1990
Filed:
Dec. 08, 1988
James E Scott, Culver City, CA (US);
John E Wreede, Moneovia, CA (US);
Hughes Aircraft Company, Los Angeles, CA (US);
Abstract
A system for monitoring intensity before, during, and after holographic exposure includes a monitoring assembly within an exposure beam and intermediate a light source and a hologram recording assembly. With the monitoring assembly in the exposure beam, a monitoring beam is produced that is directed towards detection elements located outside of the exposure beam. At the same time, the monitoring assembly allows the exposure beam to pass therethrough and onto the hologram recording assembly. The monitoring assembly may include a reflection hologram with an effective shape which is different from the supporting substrate, or glass substrates with an internal reflecting surface. In either event, the exposure beam remains undistorted. The spatial arrangement among the light source, hologram recording assembly, and detection elements are such that a reflected beam from the hologram recording assembly is directed away from the detection elements to avoid incorrect intensity monitoring.