The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 06, 1990
Filed:
Jul. 08, 1988
R Malcolm Brown, Jr, Austin, TX (US);
Shun Mizuta, Kochi, JP;
Board of Regents, The University of Texas System, Austin, TX (US);
Abstract
Disclosed are improved methods for preparing high resolution replicas for electron microscopic analysis. Replicas are prepared having a resolution capability less than ten angstroms, with structures of even less than five angstroms being readily discernible. Particular aspects of the invention concern the use of a platinum/carbon evaporant to prepare extremely thin replica surfaces which allow the visualization of structures heretofore unresolvable. The replication is performed at high vacuum, on the order of 10.sup.-5 Torr or better, with continuous rotation of the sample to allow for an even distribution of the evaporant. The resultant replica surfaces are on the order of no more than 5 to 10 angstroms thick. The replica technology disclosed herein is applicable to both biological as well as non-biological samples, including tissues, biochemicals, metals and polymers and even computer chips and superconductor surfaces.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile