The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 30, 1990
Filed:
Aug. 03, 1989
Roland L Halm, Madison, IN (US);
Regie H Zapp, Carrollton, KY (US);
Dow Corning Corporation, Midland, MI (US);
Abstract
The present invention provides a method for increasing the yield of methyldichlorosilane obtained from the reaction of silicon metal with methyl chloride without substantially decreasing the combined yield of methyldichlorosilane and dimethyldichlorosilane. This is achieved by blending the methyl chloride with an amount of hydrogen chloride sufficient to accomplish this without forming significant amounts of undesirable SiCl.sub.4 and/or HSiCl.sub.3. In accordance with a preferred embodiment of the present method the concentration of hydrogen chloride is from 0.1 to about 3 weight percent, based on methyl chloride. Most preferably the hydrogen chloride is present only from the first 50% to about 90% of the methyl chloride addition.