Method of fabricating a lateral semiconductor structure including field

Abstract

A method of fabricating a lateral semiconductor structure includes providing a semiconductor substrate and forming wells therein. Following formation of a dielectric layer on the substrate, field region openings are formed through which field regions are implanted into the substrate. The self-aligned formation of field oxidation regions to the field region openings then occurs and is followed by the formation of field plates on the field oxidation regions. A first active device region is then formed in said substrate, the formation of which is self-aligned to the field plates. This is followed by the formation of a second active device region in the first active device region which is also self-aligned to the field plates. The resulting structure allows for high speed devices that maintain consistently high current gain without sacrificing Early or breakdown voltages.