The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 23, 1990
Filed:
Oct. 03, 1989
Tohru Nobutani, Kadoma, JP;
Atsuhiro Nakamoto, Kadoma, JP;
Hideo Izumi, Kadoma, JP;
Takahiro Miyano, Kadoma, JP;
Matsushita Electric Works, Ltd., Osaka, JP;
Abstract
A method for forming a conducting metal layer on an inorganic substrate is to heat the inorganic substrate accommodated in a vacuum vessel of sputtering device in which a high degree of vacuum is attained, to lead into the vacuum vessel a discharge gas as regulated to be at a predetermined pressure, to apply a high frequency power with the inorganic substrate made as a target, to interrupt the power to regulate the discharge gas to be at a predetermined pressure relatively low, and to apply DC power with a conductive metal member made as a target for thereby forming the conducting metal layer on the inorganic substrate. The metal layer formation on the inorganic substrate is thereby simplified enough for improving the producibility in industrial scale and is still capable of attaining a satisfactory bonding strength between the metal layer and the substrate.