The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 16, 1990
Filed:
Jul. 24, 1989
Applicant:
Inventor:
Juan R Maldonado, Chappaqua, NY (US);
Assignee:
International Business Machines Corporation, Armonk, NY (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G21K / ;
U.S. Cl.
CPC ...
378 35 ; 430-5 ;
Abstract
A thin film structure for correcting magnification errors in X-ray lithography. On a conductive substrate a low dielectric constant thin film is deposited. A piezoelectric film is deposited on the low dielectric constant thin film. An electrode array is positioned on the piezoelectric film to provide a relatively uniform electric field across the electrode array. The structure may be oriented around or in the X-ray exposure area. If located outside it may be orthogonally or circularly placed about the exposure area.