The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 16, 1990
Filed:
May. 09, 1989
Johann Otto, Bad Toelz, DE;
Erich Plies, Munich, DE;
Siemens Aktiengesellschaft, Berlin and Munich, DE;
Abstract
Conventional beam blanking system generate electron pulses having a minimum width of about 100 through 200 ps. Although a reduction of the pulse width to a few tens of picoseconds is fundamentally possible, the reduction of the probe current accompanying this would result to a considerable lengthening of the measuring times. In the invention a photo-cathode (PK) is charged by a pulsed laser beam (LA) which is attached to the column of an electron beam measuring instrument and the photo-electron source is stigmatically imaged onto the beam axis (OA1) using a focusing deflection unit (SFM). A sector field magnet is used as a focusing deflection unit (SFM).