The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 16, 1990

Filed:

Feb. 24, 1989
Applicant:
Inventors:

Kouichi Kunimune, Ichihara, JP;

Yoshiya Kutsuzawa, Yokohama, JP;

Assignee:

Chisso Corporation, Osaka, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C08G / ;
U.S. Cl.
CPC ...
528 26 ; 528 38 ; 528 28 ; 528 27 ;
Abstract

The present invention provides a process for the production of silicon-containing polyimide presursors that have a viscosity most suitable for application, and when baked, can form a coating low in hygroscopicity, heat resistant, and having powerful adhesion, and a process for their cured silicon-containing polyimide. A process for the production of silicon-containing polyimide precursors having a logarithmic viscosity number of 0.05 to 5 dl/g by reacting A.sup.1 mol of fluorine-containing diacid anhydride, A.sup.2 mol of a diacid anhydride, B.sup.1 mol of a fluorine-containing diamine, B.sup.2 mol of a diamine, and C mol of an aminosilane with the mixing ratio of them such that A.sup.1, A.sup.2, B.sup.1, B.sup.2, and C are within ranges having prescribed relationships, and a process for the production of a silicon-containing polyimide by baking a solution of said precursor at 50.degree. to 500.degree. C.


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