Method for making a grating assisted optical waveguide device

Abstract

The present disclosure makes a grating assisted optical waveguide device. The method includes cleaning a substrate made of glass by means of cleaning agents; depositing a first layer made of metal onto a surface of the substrate by an evaporation process; forming a first mask by making openings in the first layer to expose first parts of the surface, the first mask being formed by a photolithographic process; immersing the substrate in a first bath of molten salt having a first preselected temperature to make a waveguide by increasing the refractive index of the glass in the first parts by an ion-exchange process; removing the first mask from the surface; immersing the substrate in a second bath of molten salt in order to bury the waveguide; depositing a second layer made of metal on the surface of the substrate by an evaporation process; forming a second mask by making openings in the second layer to expose second parts of the surface, the second mask being formed by a photolithographic process; immersing the substrate in a third bath of molten salt having a third preselected temperature to change the refractive index of the glass in the second parts by an ion-exchange process in order to form a grating, the refractive index obtained in this third immersing step being different from the refractive index obtained in the first immersing step, the third preselected temperature being lower than the first preselected temperature to avoid further diffusion of ions diffused in substrate in the first bath; and removing the second mask from the surface to obtain the grating assisted optical waveguide device.