The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 16, 1990

Filed:

Nov. 06, 1987
Applicant:
Inventors:

Manfred P Wurst, Stuttgart, DE;

Rudolf Simon, Korntal-Muenchingen, DE;

Thomas V Kahlden, Stuttgart, DE;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B65D / ; H01L / ;
U.S. Cl.
CPC ...
414416 ; 553851 ; 55473 ; 981153 ;
Abstract

The container and transfer process are intended to prevent stop contamination of semiconductor devices from occurring, even if the container is stored or handled under unclean room conditions. The semiconductor devices are subjected to an approximately laminar clean air stream passing around them in a clean air zone. A higher static pressure is maintained in the clean air zone than in the surrounding space which might be polluted with an inadmissibly high number of particles. The clean air stream carries along any dirt particles there may still be, so that they cannot settle on the semiconductor devices. Owing to the higher static pressure, a forced flow from the clean air zone of the higher static pressure outwards into the surrounding space is achieved, thus preventing an ingress of dirt particles from the surrounding space.


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