The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 09, 1990
Filed:
Aug. 08, 1988
Applicant:
Inventors:
Bernardus J Bormans, Eindhoven, NL;
Johan G Bakker, Eindhoven, NL;
Assignee:
U.S. Philips Corporation, New York, NY (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J / ;
U.S. Cl.
CPC ...
2503 / ; 2503 / ; 250398 ;
Abstract
For the selection of a pure electron beam or ion beam from a mixed beam, use is made of a combined electrostatic/magnetic deflection system, the electrostatic deflection system being formed, for example, by a tilted electrode system of a cascade system of electrodes present in the apparatus. The pure beam is directed onto an object to be irradiated as near to the object as possible in order to prevent renewed mixing.