The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 09, 1990
Filed:
Jun. 30, 1989
Applicant:
Inventors:
Chandra V Desphandey, Los Angeles, CA (US);
Rointan F Bunshah, Playa del Rey, CA (US);
Hans J Doerr, Westlake Village, CA (US);
Assignee:
The Regents of the Univ. of Calif., Oakland, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C / ; C23C / ; C23C / ; C23C / ;
U.S. Cl.
CPC ...
427 38 ; 427 39 ; 427 42 ; 4272551 ; 423446 ; 20419231 ;
Abstract
A process and apparatus that may be used for the production of diamond and doped diamond films at high rates by activated reactive vapor deposition. Carbon is evaporated in a vacuum chamber in the presence of atomic hydrogen containing plasma to form diamond precursors which then deposit on a substrate located within the vacuum chamber. The substrate temperature is maintained at between about 20.degree.-600.degree. C.