The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 02, 1990
Filed:
Oct. 21, 1987
Matsushita Electric Industrial Co., Ltd., Osaka, JP;
Abstract
This invention relates to a method of writing, erasing, and reading of a large volume, high-density information. The writing is accomplished by ionizing an element different from a substrate element, and scanning the substrate by a focused ion beam of the ionized element for depositing the atoms of the ionized element on or implanting them into the surface layer of the substrate in accordance with an information signal. The erasing is done by sputtering to scatter the written element existing on the substrate with a focused ion beam of another element. The reading is accomplished by scanning the substrate with a focused electron beam, and detecting a difference in the intensity of energy spectrum of the scattering electrons, secondary electrons and Auger electrons emitted by the element of the substrate and the written element.