The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 02, 1990
Filed:
Dec. 17, 1984
Efrem V Fudim, Whitefish Bay, WI (US);
Jeannine O Colla, Mequon, WI (US);
Johnson Service Company, Milwaukee, WI (US);
Abstract
In general and in one preferred method, a diaphragm plate may be formed by providing a vessel containing a quantity of a light-transmittive first photopolymer compound which includes, as mixed constituents, a reactive oligomer resin, a reactive monomer diluent and a photoinitiator. A first unmasked surface of the compound is irradiated with ultraviolet (UV) light for solidifying the surface to a depth equal to the relief thickness, i.e., the desired diaphragm thickness. A second surface of the compound is irradiated with UV light subsequent to being covered with a opaque mask which defines the shape of the diaphragm. This irradiation completes the formation of the diaphragm plate by solidifying the remaining, unmasked quantity of compound. The unsolidified compound is then removed from the masked area of the plate. Other preferred methods are also disclosed.