The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 02, 1990
Filed:
Jun. 24, 1988
Applicant:
Inventors:
Yuzo Mori, Katano, JP;
Kazuto Yamauchi, Suita, JP;
Assignee:
Primary Examiner:
Int. Cl.
CPC ...
B23H / ; B23H / ; B23H / ; B23H / ;
U.S. Cl.
CPC ...
2041293 ; 20412946 ; 20412955 ; 156643 ; 156646 ;
Abstract
The invention relates to a precision process, wherein a radical reaction of a radical produced from a gas on discharge or laser beam excitation in a gaseous atmosphere with an atom or molecule constituting a workpiece is utilized, a compound produced according to the reaction is vaporized and removed, and thus a workpiece such as silicon single crystal, ceramics material or the like can be smoothed, cut, bored, grooved and so forth without leaving a residual defect such as residual crack, thermally affected layer of the like on the surface.