The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 25, 1990

Filed:

Jan. 02, 1990
Applicant:
Inventors:

Hwai T Tai, Rochester, NY (US);

Yee S Ng, Fairport, NY (US);

Assignee:

Eastman Kodak Company, Rochester, NY (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H04N / ; H04N / ;
U.S. Cl.
CPC ...
358298 ; 358456 ; 358460 ; 358465 ;
Abstract

False contouring of a screened halftone image without including more sub-elements in each cell, increasing the size of each cell, or decreasing the screen frequency of the image is accomplished by assigning to each sequential sub-element of a halftone cell a weighted probability of being 'ON' in accordance with the value of the associated input signal.


Find Patent Forward Citations

Tai, Hwai. (1990). False density contour suppression using randomly modified input signals (U.S. Patent No. 4959730). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4959730

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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