The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 25, 1990
Filed:
Aug. 15, 1988
Wilbur T Miller, Rancho Palos Verdes, CA (US);
Dominic P Calamito, Rancho Palos Verdes, CA (US);
Richard H Pusch, Huntington Beach, CA (US);
Hitco, Cleveland, OH (US);
Abstract
A multi-layer angle interlock fabric is woven from warp yarns that extend in straight fashion in a common direction along the length of the fabric and fill yarns which repeatedly extend through the thickness of the fabric along angled paths between opposite broad surfaces of the fabric and interweave within the relatively straight warp yarns. The fabric can be woven using a conventional fly shuttle loom with a programmable Jacquard machine which controls the loom's harness lines to selectively raise and lower the fill yarns extending through a weaving area of the loom as the loom shuttle reciprocates through the weaving area to repeatedly extend a fill yarn across the width of the fabric being formed. Stuffer yarns can be provided by periodically extending the fill yarn across the fabric width betweem adjacent sheets of the warp yarns during weaving. Weaving the fabric in this fashion allows a slot to be formed across part of the fabric width within the fabric thickness by restricting the adjacent portions of the fill yarns to the opposite sides of the interface between an adjacent pair of fill yarn sheets where the slot is to be formed.