The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 18, 1990
Filed:
Dec. 08, 1988
Arthur J Becker, Ridgefield, CT (US);
Joel L Groves, Leonia, NJ (US);
Charles C Watson, Danbury, CT (US);
Schlumberger Technology Corporation, New York, NY (US);
Abstract
A high resolution gamma-gamma apparatus is provided with a chemical source and a photon detector in such close proximity such that the detector provides a positive response to an increase in formation density. Typically, such a response is obtained when the detector opening is within one source photon mean free path of the source opening. For a Cs 137 source, the furthest spacing would be about two inches, although spacings of less than one inch are preferable. In order to decrease background noise, shielding is placed between the source and detector. A first embodiment of the tool has an uncollimated source, and a substantially uncollimated detector with the source and detector being coaxial and with the detector behind the source and separated by shielding. A second embodiment has a collimated source with an uncollimated detector, while a third embodiment has an uncollimated source with a collimated detector. The provided apparatus are useful for high resolution density and Pe measurements. Additional axially spaced negative response detectors may be included to provided additional information which are useful in correcting for environmental effects. Also, circumferentially spaced detectors along with additional sources are useful in conducting dip analysis.