The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 18, 1990
Filed:
Sep. 15, 1989
Vinod K Sarin, Lexington, MA (US);
Charles D'Angelo, Southboro, MA (US);
Helen E Rebenne, Westboro, MA (US);
GTE Laboratories Incorporated, Waltham, MA (US);
Abstract
A chemical vapor deposition process in which an internal reactor is disposed within a chemical vapor deposition reactor including means for enclosing a reaction chamber and means for heating the reaction chamber. The position at which the internal reactor is disposed relative to the heating means is selected to provide control of the temperature within the internal reactor. At least two solid precursor materials are placed in the internal reactor and are contacted with at least one precursor gas, reactive with the solid precursor materials to produce at least two reactant gases. These gases are directed to the reaction chamber to react with one or more additional reactants.