The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 18, 1990

Filed:

Jan. 23, 1989
Applicant:
Inventor:

Louis R Semff, Plano, TX (US);

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
B32B / ;
U.S. Cl.
CPC ...
156382 ; 156500 ; 249 65 ; 425339 ; 4253421 ; 4254052 ;
Abstract

A manufacturing device has an outer chamber in which a tool is mounted. The tool is shaped to receive a thermoplastic or staged prepreg. The tool has heaters embedded within it. The chamber region between the tool and the inside wall of the chamber is filled with polysilicone polymer and pressurized to a low pressure such as 50 pounds per square inch. To insure prepreg compaction the chamber is then pressurized in the range of 3,000 pounds per square inch. The chamber to insure prepreg compaction is then pressurized and as is the polysilicone polymer to a pressure in the range of 3,000 psi. At the completion of the temperature/pressure cycle, the cured product is removed from the tool.


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Semff, Louis. (1990). High pressure lamination chamber (U.S. Patent No. 4957585). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4957585

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