The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 11, 1990
Filed:
Apr. 14, 1989
Junji Nakada, Kanagawa, JP;
Hideaki Takeuchi, Kanagawa, JP;
Fuji Photo Film Co., Ltd., Kanagawa, JP;
Abstract
A plural-cathode sputtering apparatus capable of producing mixed thin films having a period of stratification as small as 10 .ANG. without putting an undue load on the power supplies. Two different types of targets are provided on a cathode side, and a substrate onto which sputtering is performed is provided on the anode side. Magnetic field generators produce magnetic fields substantially perpendicularly intersecting the electric fields generated between the plate and the targets near and front sides of the targets. The magnetic field generators are each composed of main magnets and electromagnets, which may be combined with the main magnets. Electrical currents are produced for exciting the electromagnets which are controlled in such a manner as to change the magnetic intensity of the magnetic fields and to thereby regulate the sputtering discharge.