The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 11, 1990

Filed:

May. 01, 1989
Applicant:
Inventors:

Yoshikazu Kataoka, Kyoto, JP;

Zenji Wakimoto, Kyoto, JP;

Takeshi Sugata, Hikone, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02B / ;
U.S. Cl.
CPC ...
350481 ; 350438 ; 350464 ;
Abstract

An apochromat optical system for a photoengraving process comprises a first lens group which includes a first lens having a positive power, a second lens made of Kultz flint glass having a negative power and a third lens in the form of a meniscus having a positive power. The first to third lenses are successively disposed in order starting from the object side. A second lens group includes the substantially same configuration of lenses as in the first lens group. The lenses of the first and second lens groups are approximately symmetrical with respect to the stop. Accordingly, the system has a high aperture ratio and small curvature of a saggital and meridional image field which can reduce an astigmatic difference in a peripheral part of an image.


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