The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 04, 1990
Filed:
Jun. 06, 1988
Sungmuk Lee, Miamisburg, OH (US);
Shigemi Misono, Tokyo, JP;
The Mead Corporation, , JP;
Seiko Instruments Inc., , JP;
Abstract
An exposure apparatus has cold mirrors for reflecting visible rays irradiated from light sources and for allowing infrared rays and a part of visible rays irradiated from said light sources to pass therethrough, disposed on a side of a case body. The exposure apparatus eliminates an excessive heat-up at an original image support station by using the cold mirrors and increases a tonality and an effective speed for forming a latent image on a photosensitive sheet with supplementary exposures using a leak of light passed through the cold mirrors.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile