The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 04, 1990
Filed:
Mar. 24, 1989
Applicant:
Inventors:
Takashi Nakamura, Minami-ashigara, JP;
Kaoru Uchiyama, Minami-ashigara, JP;
Assignee:
Fuji Photo Film Co., Ltd., Kanagawa, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03D / ;
U.S. Cl.
CPC ...
354320 ; 354331 ;
Abstract
A photosensitive material processing apparatus adaptable for occasional operation is provided, comprising a processing tank filled with processing solution and an adjustable closure for controlling access to the tank through its top opening. The adjustable closure includes a fixed lid, a movable lid, and a drive for the movable lid. The operating openness, which is the surface area of the solution open to the ambient atmosphere divided by the volume of the solution, is set in a specific range and the quiescent openness is up to 70% of the operating openness.